Invention Grant
- Patent Title: Method for producing monocrystalline structures
- Patent Title (中): 单晶结构的制造方法
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Application No.: US10729201Application Date: 2003-12-05
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Publication No.: US07306670B2Publication Date: 2007-12-11
- Inventor: Thomas Beck , Georg Bostanjoglo , Nigel-Philip Cox , Rolf Wilkenhöner
- Applicant: Thomas Beck , Georg Bostanjoglo , Nigel-Philip Cox , Rolf Wilkenhöner
- Applicant Address: DE Muenchen
- Assignee: Siemens Aktiengesellschaft
- Current Assignee: Siemens Aktiengesellschaft
- Current Assignee Address: DE Muenchen
- Priority: DE10216662 20020415; DE10243558 20020919
- Main IPC: C30B13/00
- IPC: C30B13/00

Abstract:
In the case of the epitaxial growth according to the prior art, a number o strips often have to be produced in a plane in order to restore an area to be repaired. This leads to overlapping and misorientation of the crystalline structures. In the case of the method according to the invention, the strip is of such a width that no overlapping occurs, since the width is adapted to the contour of the area to be repaired.
Public/Granted literature
- US20040112280A1 Method for producing monocrystalline structures Public/Granted day:2004-06-17
Information query
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