Invention Grant
- Patent Title: Production method for dielectric resonator device
- Patent Title (中): 介质谐振器装置的制造方法
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Application No.: US10238446Application Date: 2002-09-09
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Publication No.: US07308749B2Publication Date: 2007-12-18
- Inventor: Takahiro Okada , Jinsei Ishihara , Hideyuki Kato , Hitoshi Tada
- Applicant: Takahiro Okada , Jinsei Ishihara , Hideyuki Kato , Hitoshi Tada
- Applicant Address: JP Kyoto-Fu
- Assignee: Murata Manufacturing Co., Ltd
- Current Assignee: Murata Manufacturing Co., Ltd
- Current Assignee Address: JP Kyoto-Fu
- Agency: Dickstein, Shapiro, LLP.
- Priority: JP2001-273916 20010910
- Main IPC: H04R31/00
- IPC: H04R31/00

Abstract:
A method of forming a dielectric resonator from an inner-conductor-formed hole that has a substantially rectangular or substantially elliptical cross section in a direction perpendicular to the depth direction thereof, by placing a rotary cutting disk in contact with the edge of the opening of the inner-conductor-formed hole, and removing portions of an outer conductor and the inner conductor in the contact portion with the rotary cutting disk, thereby separating the inner conductor and the outer conductor.
Public/Granted literature
- US20030046806A1 Production method for dielectric resonator device Public/Granted day:2003-03-13
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