发明授权
- 专利标题： Method for rounding bottom corners of trench and shallow trench isolation process
- 专利标题（中）： 沟槽底角圆角和浅沟槽隔离工艺的方法
-
申请号： US10997507申请日： 2004-11-24
-
公开(公告)号： US07309641B2公开(公告)日： 2007-12-18
- 发明人: Kao-Su Huang
- 申请人： Kao-Su Huang
- 申请人地址： TW Hsinchu
- 专利权人： United Microelectronics Corp.
- 当前专利权人： United Microelectronics Corp.
- 当前专利权人地址： TW Hsinchu
- 代理机构： J.C. Patents
- 主分类号： H01L21/76
- IPC分类号： H01L21/76 ; H01L21/3065
摘要：
A method for rounding the bottom corners of a trench is described. In the method, an etching process is performed using a fluorocarbon compound with at least two carbon atoms, He and O2 as an etching gas to round the bottom corners of the trench.