Invention Grant
- Patent Title: Collector for EUV light source
- Patent Title (中): EUV光源收集器
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Application No.: US11603732Application Date: 2006-11-21
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Publication No.: US07309871B2Publication Date: 2007-12-18
- Inventor: Norbert Bowering
- Applicant: Norbert Bowering
- Applicant Address: US CA San Diego
- Assignee: Cymer, Inc.
- Current Assignee: Cymer, Inc.
- Current Assignee Address: US CA San Diego
- Agent William Cray
- Main IPC: H01J35/20
- IPC: H01J35/20

Abstract:
An apparatus/method may comprise, a multi-layer reflecting coating forming an EUV reflective surface which may comprise an inter-diffusion barrier layer which may comprise a carbide selected from the group ZrC and NbC or a boride selected from the group ZrB2 and NbB2 or a disilicide selected from the group ZrSi2 and NbSi2 or a nitride selected from the group BN, ZrN, NbN, BN, ScN and Si3N4. The apparatus and method may comprise an EUV light source collector which may comprise a collecting mirror which may comprise a normal angle of incidence multi-layer reflecting coating; an inter-diffusion barrier layer comprising a material selected from the group comprising a carbide selected from the group ZrC and NbC, or a boride selected from the group ZrB2 and NbB2 or a disilicide selected from the group ZrSi2 and NbSi2 a nitride selected from the group BN, ZrN, NbN, BN, ScN and Si3N4.
Public/Granted literature
- US20070114470A1 Collector for EUV light source Public/Granted day:2007-05-24
Information query