发明授权
- 专利标题: Method for manufacturing a piezoelectric device
- 专利标题(中): 制造压电元件的方法
-
申请号: US11000517申请日: 2004-11-30
-
公开(公告)号: US07310862B2公开(公告)日: 2007-12-25
- 发明人: Takamitsu Higuchi , Setsuya Iwashita , Hiromu Miyazawa
- 申请人: Takamitsu Higuchi , Setsuya Iwashita , Hiromu Miyazawa
- 申请人地址: JP
- 专利权人: Seiko Epson Corporation
- 当前专利权人: Seiko Epson Corporation
- 当前专利权人地址: JP
- 代理机构: Harness, Dickey & Pierce, P.L.C.
- 优先权: JP2003-401184 20031201
- 主分类号: H01L41/22
- IPC分类号: H01L41/22
摘要:
A method is provided for effectively manufacturing a piezoelectric device equipped with a piezoelectric film with a crystal orientation that is aligned in a desired direction. An interlayer which partially has a layer formed by an ion beam assisted laser ablation method while controlling a temperature rise accompanied by an ion beam irradiation by a cooling device and is bi-axially oriented as a whole, is formed on a surface of a substrate. A lower electrode is formed on the interlayer. A piezoelectric film is formed on the lower electrode. An upper electrode is formed on the piezoelectric film. The lower electrode and the piezoelectric film are formed by epitaxial growth.
公开/授权文献
信息查询
IPC分类: