发明授权
US07312851B2 Projection optical system, exposure apparatus, and exposure method in which a reflective projection optical system has a non-circular aperture stop
有权
投影光学系统，曝光装置和曝光方法，其中反射投影光学系统具有非圆形孔径光阑
- 专利标题： Projection optical system, exposure apparatus, and exposure method in which a reflective projection optical system has a non-circular aperture stop
- 专利标题（中）： 投影光学系统，曝光装置和曝光方法，其中反射投影光学系统具有非圆形孔径光阑
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申请号： US11158096申请日： 2005-06-22
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公开(公告)号： US07312851B2公开(公告)日： 2007-12-25
- 发明人: Hideki Komatsuda , Tomowaki Takahashi , Masayuki Suzuki
- 申请人： Hideki Komatsuda , Tomowaki Takahashi , Masayuki Suzuki
- 申请人地址： JP Tokyo JP Tokyo
- 专利权人： Nikon Corporation,Canon Kabushiki Kaisha
- 当前专利权人： Nikon Corporation,Canon Kabushiki Kaisha
- 当前专利权人地址： JP Tokyo JP Tokyo
- 代理机构： Oliff & Berridge, PLC
- 优先权： JP2004-184657 20040623
- 主分类号： G03B27/54
- IPC分类号： G03B27/54 ; G03B27/68
摘要：
A projection optical system is a catoptric system in which a field of view region and an imaging region are located spaced from an optical axis, in which a numerical aperture of light reaching each point on an image plane is substantially uniform regardless of an image height and a direction. An aperture stop for defining the numerical aperture of the projection optical system is provided, and the aperture stop is provided with an aperture portion in a predetermined shape in which the numerical aperture of light reaching each point within a predetermined region is substantially uniform over the predetermined region, that is, in a shape in which dimensions concerning two directions perpendicular to each other are different from each other. A predetermined shape of the aperture portion is defined so as to compensate for the effect of non-uniformity of the numerical aperture of light reaching each point within a predetermined region due to a partial optical system arranged between the aperture stop and an image plane not satisfying a desired projective relationship.
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