发明授权
- 专利标题： Method and apparatus for reducing biological contamination in an immersion lithography system
- 专利标题（中）： 浸没光刻系统中减少生物污染的方法和装置
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申请号： US11121437申请日： 2005-05-04
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公开(公告)号： US07315033B1公开(公告)日： 2008-01-01
- 发明人: Adam R. Pawloski , Harry J. Levinson , Jongwook Kye
- 申请人： Adam R. Pawloski , Harry J. Levinson , Jongwook Kye
- 申请人地址： US CA Sunnyvale
- 专利权人： Advanced Micro Devices, Inc.
- 当前专利权人： Advanced Micro Devices, Inc.
- 当前专利权人地址： US CA Sunnyvale
- 代理机构： Renner, Otto, Boisselle & Sklar, LLP
- 主分类号： A61N5/00
- IPC分类号： A61N5/00
摘要：
Disclosed are a method of reducing biological contamination in an immersion lithography system and an immersion lithography system configured to reduce biological contamination. A reflecting element and/or an irradiating element is used to direct radiation to kill biological contaminates present with respect to at least one of i) a volume adjacent a final element of the projection system or ii) an immersion medium supply device disposed adjacent the final element.