发明授权
- 专利标题: Apparatus for drying substrate and method thereof
- 专利标题(中): 干燥基材的设备及其方法
-
申请号: US11158912申请日: 2005-06-22
-
公开(公告)号: US07322385B2公开(公告)日: 2008-01-29
- 发明人: Sang-Yong Kim , Chang-Ki Hong , Sang-Jun Choi , Woo-Gwan Shim
- 申请人: Sang-Yong Kim , Chang-Ki Hong , Sang-Jun Choi , Woo-Gwan Shim
- 申请人地址: KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: F. Chau & Assoc., LLC
- 优先权: KR10-2004-0047155 20040623
- 主分类号: B65B1/04
- IPC分类号: B65B1/04
摘要:
An apparatus for drying a substrate using the Marangoni effect is disclosed. The apparatus includes a rotatable supporting portion on which a substrate is placed. A first nozzle for supplying de-ionized water and a second nozzle for supplying isopropyl alcohol vapor are provided on the supporting portion. When the isopropyl alcohol vapor is supplied to the center of the substrate at the initial stage, the amount of alcohol that reaches the substrate is controlled by a controlling portion such that the amount of the second liquid gradually increases.
公开/授权文献
- US20060042722A1 Apparatus for drying substrate and method thereof 公开/授权日:2006-03-02
信息查询
IPC分类: