Invention Grant
- Patent Title: Clean process for an electron beam source
- Patent Title (中): 电子束源的清洁过程
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Application No.: US10783748Application Date: 2004-02-20
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Publication No.: US07323399B2Publication Date: 2008-01-29
- Inventor: Alexandros T. Demos , Khaled A. Elsheref , Josphine J. Chang , Hichem M'saad
- Applicant: Alexandros T. Demos , Khaled A. Elsheref , Josphine J. Chang , Hichem M'saad
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: H01L21/20
- IPC: H01L21/20
Abstract:
One embodiment of the present invention is a method for cleaning an electron beam treatment apparatus that includes: (a) generating an electron beam that energizes a cleaning gas in a chamber of the electron beam treatment apparatus; (b) monitoring an electron beam current; (c) adjusting a pressure of the cleaning gas to maintain the electron beam current at a substantially constant value; and (d) stopping when a predetermined condition has been reached.
Public/Granted literature
- US20040159638A1 Clean process for an electron beam source Public/Granted day:2004-08-19
Information query
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