发明授权
US07326510B2 Polycarbocyclic derivatives for modification of resist, optical and etch resistance properties
失效
用于改性抗蚀剂，光学和耐蚀刻性能的多环碳环衍生物
- 专利标题： Polycarbocyclic derivatives for modification of resist, optical and etch resistance properties
- 专利标题（中）： 用于改性抗蚀剂，光学和耐蚀刻性能的多环碳环衍生物
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申请号： US10494547申请日： 2002-10-31
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公开(公告)号： US07326510B2公开(公告)日： 2008-02-05
- 发明人: Evangelos Gogolides , Panagiotis Argitis , Elias Andrea Couladouros , Veroniki Petrou Vidali , Maria Vasilopoulou , George Cordoyiannis
- 申请人： Evangelos Gogolides , Panagiotis Argitis , Elias Andrea Couladouros , Veroniki Petrou Vidali , Maria Vasilopoulou , George Cordoyiannis
- 代理机构： Mathews, Shepherd, McKay & Bruneau, P.A.
- 优先权： GR20010100506 20011101
- 国际申请： PCT/EP02/12284 WO 20021031
- 国际公布： WO03/038523 WO 20030508
- 主分类号： G03F7/004
- IPC分类号： G03F7/004
摘要：
Mixed carbocycle derivatives containing at least two carbocycles per molecule from the group of anthracenes, adamantanes and steroids with functionalized carbon chains are synthesized and used as modifiers of resist properties and especially etch resistance enhancement and absorption characteristics. These derivatives are characterized by formulas I-V, where A and R may be an anthryl- and/or an adamantyl- and/or a steroid moiety. Methods for the preparation of the above compounds are disclosed.