Invention Grant
- Patent Title: Defect detection method
- Patent Title (中): 缺陷检测方法
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Application No.: US10908828Application Date: 2005-05-27
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Publication No.: US07339391B2Publication Date: 2008-03-04
- Inventor: Kun Lin
- Applicant: Kun Lin
- Applicant Address: TW Hsin-Chu
- Assignee: United Microelectronics Corp.
- Current Assignee: United Microelectronics Corp.
- Current Assignee Address: TW Hsin-Chu
- Agent Winston Hsu
- Main IPC: G01R31/26
- IPC: G01R31/26

Abstract:
A defect detection method is disclosed, in which the method includes: providing a semiconductor sample, wherein the semiconductor sample comprises at least one defect; utilizing a failure analysis for detecting at least one suspected area on the backside of the semiconductor sample; utilizing a physical energy for forming a plurality of reference marks around the suspected area on the backside of the semiconductor sample; and utilizing the reference marks for determining the relative location of the defect on the front side of the semiconductor sample.
Public/Granted literature
- US20060270067A1 Defect Detection Method Public/Granted day:2006-11-30
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