发明授权
- 专利标题： Thiol compound, photopolymerization initiator composition and photosensitive composition
- 专利标题（中）： 硫醇化合物，光聚合引发剂组合物和感光组合物
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申请号： US10505778申请日： 2003-02-27
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公开(公告)号： US07341828B2公开(公告)日： 2008-03-11
- 发明人: Tsuyoshi Katoh , Hirotoshi Kamata , Mina Onishi
- 申请人： Tsuyoshi Katoh , Hirotoshi Kamata , Mina Onishi
- 申请人地址： JP Tokyo
- 专利权人： Showa Denko K.K.
- 当前专利权人： Showa Denko K.K.
- 当前专利权人地址： JP Tokyo
- 代理机构： Sughrue Mion, PLLC
- 优先权： JP2002-052515 20020228; JP2002-257766 20020903
- 国际申请： PCT/JP03/02219 WO 20030227
- 国际公布： WO03/072614 WO 20030904
- 主分类号： G03C1/73
- IPC分类号： G03C1/73 ; G03F7/031 ; C08F2/46 ; C07C321/04
摘要：
A photopolymerization initiator composition containing a thiol compound having a mercapto group-containing group that has at least one substituent on the carbon atoms on carbon atom(s) at the α- and/or β-position with respect to the mercapto group and a photopolymerization initiator; a photosensitive composition containing the composition; and a novel thiol compound for use in these compositions. The photosensitive composition containing the photopolymerizazion initiator composition of the present invention has high sensitivity and excellent storage stability and enables reduction in cost due by increasing productivity.
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