Invention Grant
US07342287B2 Power gating schemes in SOI circuits in hybrid SOI-epitaxial CMOS structures
有权
混合SOI外延CMOS结构中SOI电路中的功率门控方案
- Patent Title: Power gating schemes in SOI circuits in hybrid SOI-epitaxial CMOS structures
- Patent Title (中): 混合SOI外延CMOS结构中SOI电路中的功率门控方案
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Application No.: US11184244Application Date: 2005-07-19
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Publication No.: US07342287B2Publication Date: 2008-03-11
- Inventor: Ching-Te Chuang , Koushik K. Das , Shih-Hsien Lo , Jeffrey W. Sleight
- Applicant: Ching-Te Chuang , Koushik K. Das , Shih-Hsien Lo , Jeffrey W. Sleight
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent Satheesh K. Karra
- Main IPC: H01L27/092
- IPC: H01L27/092

Abstract:
Disclosed are a multi-threshold CMOS circuit and a method of designing such a circuit. The preferred embodiment combines an MTCMOS scheme and a hybrid SOI-epitaxial CMOS structure. Generally, the logic transistors (both nFET and pFET) are placed in SOI, preferably in a high-performance, high density UTSOI; while the headers or footers are made of bulk epitaxial CMOS devices, with or without an adaptive well-biasing scheme. The logic transistors are based on (100) SOI devices or super HOT, the header devices are in bulk (100) or (110) pFETs with or without an adaptive well biasing scheme, and the footer devices are in bulk (100) NFET with or without an adaptive well biasing scheme.
Public/Granted literature
- US20070018248A1 Power gating schemes in SOI circuits in hybrid SOI-epitaxial CMOS structures Public/Granted day:2007-01-25
Information query
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