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US07344945B1 Method of manufacturing a drain side gate trench metal-oxide-semiconductor field effect transistor 失效
制造漏极侧栅极沟槽金属氧化物半导体场效应晶体管的方法

Method of manufacturing a drain side gate trench metal-oxide-semiconductor field effect transistor
摘要:
Embodiments of the present invention provide a striped or closed cell trench metal-oxide-semiconductor field effect transistor (TMOSFET). The striped or closed cell TMOSFET comprises a source region, a body region disposed above the source region, a drift region disposed above the body region, a drain region disposed above the drift region. A gate region is disposed above the source region and adjacent the body region. A gate insulator region electrically isolates the gate region from the source region, body region, drift region and drain region. The body region is electrically coupled to the source region.
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