Invention Grant
- Patent Title: Lens array for electron beam lithography tool
- Patent Title (中): 用于电子束光刻工具的透镜阵列
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Application No.: US09414004Application Date: 1999-10-07
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Publication No.: US07345290B2Publication Date: 2008-03-18
- Inventor: Victor Katsap , Pieter Kruit , Daniel Moonen , Warren Kazmir Waskiewicz
- Applicant: Victor Katsap , Pieter Kruit , Daniel Moonen , Warren Kazmir Waskiewicz
- Applicant Address: US PA Allentown
- Assignee: Agere Systems Inc
- Current Assignee: Agere Systems Inc
- Current Assignee Address: US PA Allentown
- Main IPC: G21K5/10
- IPC: G21K5/10

Abstract:
A method and apparatus for controlling beam emittance by placing a lens array in a drift space of an illumination system component. The illumination system component may be an electron gun or a liner tube or drift tube, attachable to an electron gun. The lens array may be one or more mesh grids or a combination of grids and continuous foils. The lens array forms a multitude of microlenses resembling an optical “fly's eye” lens. The lens array splits an incoming solid electron beam into a multitude of subbeams, such that the outgoing beam emittance is different from the incoming beam emittance, while beam total current remains unchanged. The method and apparatus permit independent control of beam current and beam emittance, which is beneficial in a SCALPEL illumination system.
Public/Granted literature
- US20030010934A1 LENS ARRAY FOR ELECTRON BEAM LITHOGRAPHY TOOL Public/Granted day:2003-01-16
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