发明授权
- 专利标题： Corona based charge voltage measurement
- 专利标题（中）： 基于电晕的充电电压测量
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申请号： US11421855申请日： 2006-06-02
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公开(公告)号： US07345306B1公开(公告)日： 2008-03-18
- 发明人: Sergio Edelstein , Eric F. Bouche , Jianou Shi , Shiyou Pei , Xiafang Zhang
- 申请人： Sergio Edelstein , Eric F. Bouche , Jianou Shi , Shiyou Pei , Xiafang Zhang
- 申请人地址： US CA Milpitas
- 专利权人： KLA-Tencor Technologies Corporation
- 当前专利权人： KLA-Tencor Technologies Corporation
- 当前专利权人地址： US CA Milpitas
- 代理机构： Luedeka, Neely & Graham, P.C.
- 主分类号： H01L23/58
- IPC分类号： H01L23/58
摘要：
A method of measuring electrical characteristics of a gate dielectric. The gate dielectric is local annealed by directing a highly localized energy source at the measurement area, such that the measurement area is brought to an annealing temperature while surrounding structures are not significantly heated. While heating the measurement area, a flow of a gas containing a percentage of hydrogen, deuterium, or water vapor at a flow rate is directed to the measurement area. A charge is inducted on the measurement area and the electrical characteristics of the gate dielectric are measured using non contact electrical probing.
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