发明授权
- 专利标题： Method and apparatus for characterizing microelectromechanical devices on wafers
- 专利标题（中）： 用于表征晶片上的微机电装置的方法和装置
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申请号： US10875555申请日： 2004-06-23
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公开(公告)号： US07345806B2公开(公告)日： 2008-03-18
- 发明人: Dmitri Simonian , Casey Feinstein
- 申请人： Dmitri Simonian , Casey Feinstein
- 申请人地址： US TX Dallas
- 专利权人： Texas Instruments Incorporated
- 当前专利权人： Texas Instruments Incorporated
- 当前专利权人地址： US TX Dallas
- 代理商 Wade James Brady, III; Frederick J. Telecky, Jr.
- 主分类号： G02B26/00
- IPC分类号： G02B26/00 ; H01J5/16
摘要：
The invention provides a method and apparatus for evaluating the quality of microelectromechanical devices having deformable and deflectable members using resonation techniques. Specifically, product quality characterized in terms of uniformity of the deformable and deflectable elements is inspected with an optical resonance mapping mechanism on a wafer-level.
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