Invention Grant
- Patent Title: Apparatus for generating a plurality of beamlets
- Patent Title (中): 用于产生多个子束的装置
-
Application No.: US11545975Application Date: 2006-10-10
-
Publication No.: US07348567B1Publication Date: 2008-03-25
- Inventor: Pieter Kruit
- Applicant: Pieter Kruit
- Applicant Address: NL CJ Delft
- Assignee: Mapper Lithography IP B.V.
- Current Assignee: Mapper Lithography IP B.V.
- Current Assignee Address: NL CJ Delft
- Agency: Blakely, Sokoloff, Taylor & Zafman
- Main IPC: H01J37/04
- IPC: H01J37/04

Abstract:
The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means.In this way, it is possible to reduce aberrations of the converging means.
Public/Granted literature
- US20080073547A1 APPARATUS FOR GENERATING A PLURALITY OF BEAMLETS Public/Granted day:2008-03-27
Information query