发明授权
- 专利标题: System and method for high intensity small spot optical metrology
- 专利标题(中): 高强度小光点光学测量系统及方法
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申请号: US11264733申请日: 2005-10-31
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公开(公告)号: US07349103B1公开(公告)日: 2008-03-25
- 发明人: Mehdi Balooch , Marc Aho , Homan Amin , Abdul Rahim Forouhi , Phillip Walsh , Guoguang Li
- 申请人: Mehdi Balooch , Marc Aho , Homan Amin , Abdul Rahim Forouhi , Phillip Walsh , Guoguang Li
- 申请人地址: US CA Santa Clara
- 专利权人: n&k Technology, Inc.
- 当前专利权人: n&k Technology, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Lumen Patent Firm, Inc.
- 主分类号: G01B11/24
- IPC分类号: G01B11/24
摘要:
An apparatus and method for examining features of a sample with a broadband beam of light obtained from a long-wavelength source that may include two distinct emitters that emit a long-wavelength radiation and a short-wavelength source that emits a short-wavelength radiation. A passage is positioned between the sources and a reflective beam combining optics is provided for shaping the long-wavelength radiation to enter the short-wavelength source via the passage and also for shaping the short-wavelength radiation that exits through the passage and propagates toward the long-wavelength source. The reflective beam combining optics shape the short-wavelength radiation such that it re-enters the short-wavelength source via the passage and is combined with the long-wavelength radiation into the broadband beam that exits the short-wavelength source. A beam steering optics projects the broadband beam to a spot on the sample, and a scattered broadband radiation from the spot is intercepted and shaped to a broadband signal beam, which is passed through a sampling pinhole that passes a test portion of it on to a detector for optical examination; the test portion that is passed can correspond to a center portion of the spot.
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