发明授权
US07350316B2 Meniscus proximity system for cleaning semiconductor substrate surfaces
有权
用于清洁半导体衬底表面的半月板接近系统
- 专利标题： Meniscus proximity system for cleaning semiconductor substrate surfaces
- 专利标题（中）： 用于清洁半导体衬底表面的半月板接近系统
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申请号： US11619599申请日： 2007-01-03
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公开(公告)号： US07350316B2公开(公告)日： 2008-04-01
- 发明人: Carl Woods , James P. Garcia , John de Larios
- 申请人： Carl Woods , James P. Garcia , John de Larios
- 申请人地址： US CA Fremont
- 专利权人： Lam Research Corporation
- 当前专利权人： Lam Research Corporation
- 当前专利权人地址： US CA Fremont
- 代理机构： Martine Penilla & Gencarella, LLP
- 主分类号： B08B3/00
- IPC分类号： B08B3/00 ; F26B5/12
摘要：
A system and apparatus for cleaning a substrate is provided. The system includes a first head configured as a bar shape that extends approximately a diameter of the substrate. The first head is configured for placement on a first side of the substrate. A second head is also provided, and is configured as a bar shape that extends approximately the diameter of the wafer, and the second head is configured for placement on a second side of the substrate, such that the second side is opposite the first side. In this example, each of the first head and the second head have conduits formed therein along the diameter of the substrate for delivering and removing fluids so that a meniscus is capable of being contained between each of the first head and a substrate surface of the first side of the substrate and the second head and a substrate surface of the second side of the substrate.