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US07352434B2 Lithographic apparatus and device manufacturing method 有权
平版印刷设备和器件制造方法

Lithographic apparatus and device manufacturing method
摘要:
In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
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