发明授权
US07354618B2 Oxygen plasma post-deposition treatment of magnetic recording media
有权
磁记录介质的氧等离子体后沉积处理
- 专利标题: Oxygen plasma post-deposition treatment of magnetic recording media
- 专利标题(中): 磁记录介质的氧等离子体后沉积处理
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申请号: US10704593申请日: 2003-11-12
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公开(公告)号: US07354618B2公开(公告)日: 2008-04-08
- 发明人: Chung-Hee Chang , Xiaoding Ma , Michael Joseph Stirniman , Jeffrey Shane Reiter , Samuel Dacke Harkness, IV , Rajiv Ranjan
- 申请人: Chung-Hee Chang , Xiaoding Ma , Michael Joseph Stirniman , Jeffrey Shane Reiter , Samuel Dacke Harkness, IV , Rajiv Ranjan
- 申请人地址: US CA Scotts Valley
- 专利权人: Seagate Technology LLC
- 当前专利权人: Seagate Technology LLC
- 当前专利权人地址: US CA Scotts Valley
- 代理机构: McDermott Will & Emery LLP
- 主分类号: B05D5/12
- IPC分类号: B05D5/12
摘要:
A method of manufacturing magnetic recording media, comprising sequential steps of: (a) providing an apparatus for manufacturing the media; (b) supplying the apparatus with at least one substrate for the media; (c) forming a magnetic recording layer on the at least one substrate in a first portion of the apparatus, the magnetic recording layer including a surface; (d) treating the surface of the magnetic recording layer with an ionized oxygen-containing plasma in a second portion of the apparatus to form a plasma oxidized surface layer; and (e) forming a protective overcoat layer on the plasma oxidized surface layer of the magnetic recording layer in a third portion of the apparatus.
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