发明授权
- 专利标题: Electron beam device
- 专利标题(中): 电子束装置
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申请号: US11499640申请日: 2006-08-07
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公开(公告)号: US07355177B2公开(公告)日: 2008-04-08
- 发明人: Chisato Kamiya , Masahiro Akatsu , Mitsugu Sato
- 申请人: Chisato Kamiya , Masahiro Akatsu , Mitsugu Sato
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Dickstein Shapiro LLP
- 优先权: JP2003-000750 20030107
- 主分类号: H01J37/29
- IPC分类号: H01J37/29 ; H01J37/244 ; G01N23/04
摘要:
Disclosed here is a high resolution scanning electron microscope having an in-lens type objective lens. The microscope is structured so as to detect transmission electrons scattering at wide angles to observe high contrast STEM images according to each sample and purpose.A dark-field detector is disposed closely to the objective lens magnetic pole. The microscope is provided with means for moving the dark-field detector along a light axis so as to control the scattering angle of each detected dark-field signal.
公开/授权文献
- US20060284093A1 Electron beam device 公开/授权日:2006-12-21
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