发明授权
- 专利标题: Interposer and method for fabricating the same
- 专利标题(中): 插件及其制造方法
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申请号: US11338857申请日: 2006-01-25
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公开(公告)号: US07355290B2公开(公告)日: 2008-04-08
- 发明人: Takeshi Shioga , Yoshikatsu Ishizuki , Kanae Nakagawa , Taiji Sakai , Masataka Mizukoshi , John David Baniecki , Kazuaki Kurihara
- 申请人: Takeshi Shioga , Yoshikatsu Ishizuki , Kanae Nakagawa , Taiji Sakai , Masataka Mizukoshi , John David Baniecki , Kazuaki Kurihara
- 申请人地址: JP Kawasaki
- 专利权人: Fujitsu Limited
- 当前专利权人: Fujitsu Limited
- 当前专利权人地址: JP Kawasaki
- 代理机构: Kratz, Quintos & Hanson, LLP
- 优先权: JP2005-286978 20050930
- 主分类号: H01L23/29
- IPC分类号: H01L23/29
摘要:
The interposer comprises a base 8 formed of a plurality of resin layers 68, 20, 32, 48; thin-film capacitors 18a, 18b buried between a first resin layer 68 of said plurality of resin layers and a second resin layer 20 of said plurality of resin layers, which include first capacitor electrodes 12a, 12b, second capacitor electrodes 16 opposed to the first capacitor electrode 12a, 12b and the second capacitor electrode 16, and a capacitor dielectric film 14 of a relative dielectric constant of 200 or above formed between the first capacitor electrode 12a, 12b and the second capacitor electrode 16; a first through-electrode 77a formed through the base 8 and electrically connected to the first capacitor electrode 12a, 12b; and a second through-electrode 77b formed through the base 8 and electrically connected to the second capacitor electrode 16.
公开/授权文献
- US20070090546A1 Interposer and method for fabricating the same 公开/授权日:2007-04-26
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