发明授权
- 专利标题: Defect inspection apparatus and defect inspection method
- 专利标题(中): 缺陷检查装置和缺陷检查方法
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申请号: US11072317申请日: 2005-03-07
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公开(公告)号: US07359546B2公开(公告)日: 2008-04-15
- 发明人: Shinji Sugihara , Ikunao Isomura , Junji Oaki , Toru Tojo
- 申请人: Shinji Sugihara , Ikunao Isomura , Junji Oaki , Toru Tojo
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- 优先权: JP2004-064054 20040308
- 主分类号: G06K9/00
- IPC分类号: G06K9/00
摘要:
A defect inspection method comprises irradiating a sample including a pattern under inspection with light, acquiring measurement pattern data of the pattern based on intensity of light reflected by the sample, generating conversion data including pixel data corresponding to the measurement pattern data from design data of the sample, applying FIR filter process to the conversion data, reconstructing the conversion data by replacing pixel data having value not larger than first reference value with first pixel data, replacing pixel data having value larger than second reference value larger than first reference value with second pixel data having value larger than first pixel data, replacing pixel data having value larger than first reference value and less than second reference value with third pixel data having value between the value of first and second pixel data, the pixel data having larger value being replaced with third pixel data having higher value.
公开/授权文献
- US20050232477A1 Defect inspection apparatus and defect inspection method 公开/授权日:2005-10-20
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