摘要:
A pattern inspection apparatus, including an optical image acquiring unit that acquires optical image data of a target plate to be inspected, the target plate being formed as a pattern. The pattern inspection apparatus also includes a design image data generating unit that generates design image data based on a design pattern serving as a base of pattern formation of the target plate. The pattern inspection apparatus further includes a comparing unit that inputs region image data generated based on information of a region pattern which is input to the pattern inspection apparatus. The information of the region pattern represents a predetermined region and is formed in the same format as that of information of the design pattern. The comparing unit compares the optical image data with the design image data based on the region image data.
摘要:
A pattern inspection apparatus uses a die-to-database comparison method which compares detected pattern data obtained from an optical image of a pattern of a plate to be inspected with first reference pattern data obtained from designed pattern data in combination with a die-to-die comparison method which compares the detected pattern data with second reference pattern data obtained by detecting an area to be a basis for repetition. A computer detects presence of a plurality of repeated pattern areas from layout information contained in the designed pattern data, reads the arrangement, the number, the dimension and the repeated pitch of the repeated pattern areas, and automatically fetches an inspection area of the die-to-die comparison method.
摘要:
A defect inspection method comprises irradiating a sample including a pattern under inspection with light, acquiring measurement pattern data of the pattern based on intensity of light reflected by the sample, generating conversion data including pixel data corresponding to the measurement pattern data from design data of the sample, applying FIR filter process to the conversion data, reconstructing the conversion data by replacing pixel data having value not larger than first reference value with first pixel data, replacing pixel data having value larger than second reference value larger than first reference value with second pixel data having value larger than first pixel data, replacing pixel data having value larger than first reference value and less than second reference value with third pixel data having value between the value of first and second pixel data, the pixel data having larger value being replaced with third pixel data having higher value.
摘要:
The present invention is to allow rapid detection of such a defect as buried in a pixel positional deviation, expansion/contraction noise or sensing noise on an image. A relationship between an inspection reference pattern image and a pattern image to be inspected is identified during inspection to construct a mathematical model obtained by absorbing (applying fitting on) a pixel positional deviation, expansion/contraction noise or sensing noise on an image, and a defect is detected by comparing a new inspection reference pattern image (model image) obtained by simulating the mathematical model and a pattern image to be inspected.
摘要:
An inspection apparatus and method comprising a unit for acquiring an optical image of an object to be inspected by irradiating the object with light, wherein the unit includes a line sensor comprising a plurality of sensors linearly arranged in a row, a generating unit for generating a reference image from design data of the object to be inspected, a comparing unit for comparing the optical image with the reference image, a unit for storing data of three lines acquired by the line sensor, and calculating differences between a gradation value of a pixel on a center line and each gradation value of the eight pixels adjacent to the pixel determining if the pixel is a defect if all of the eight differences of the adjacent pixels are more than a predetermined threshold.
摘要:
A pattern inspection apparatus which compares a plurality of partial optical image data of a same target plate to be inspected, the target plate being formed as a pattern, includes an optical image data acquiring unit which acquires optical image data of the target plate to be inspected, and a comparing circuit which compares the plurality of partial optical image data. In the comparing circuit, region image data generated based on information of region pattern representing a predetermined region is input, and a decision criterion is changed with reference to the input region image data when the plurality of partial optical image data are compared with each other to decide the presence/absence of a defect on the target plate.
摘要:
A pattern inspecting method, comprising preparing a sample having a first and a second inspection regions and an imaging device having a plurality of pixels, scanning the first inspection region to a first direction using the imaging device to obtain a first measurement pattern representing at least parts of the first inspection region, scanning the second inspection region to the first direction using the imaging device to obtain a second measurement pattern representing at least parts of the second inspection region, comparing the first measurement pattern and the second measurement pattern with each other to determine presence or absence of a defect formed on the sample, and controlling a scanning condition for scanning a pattern of the second inspection region by the imaging device so as to keep the same with the scanning condition when the pattern of the first inspection region is scanned by the imaging device.
摘要:
A pattern inspection apparatus which compares a plurality of partial optical image data of a same target plate to be inspected, the target plate being formed as a pattern, includes an optical image data acquiring unit which acquires optical image data of the target plate to be inspected, and a comparing circuit which compares the plurality of partial optical image data. In the comparing circuit, region image data generated based on information of region pattern representing a predetermined region is input, and a decision criterion is changed with reference to the input region image data when the plurality of partial optical image data are compared with each other to decide the presence/absence of a defect on the target plate.
摘要:
A mask-defect inspection apparatus including a plurality of illumination optical systems (2) for illuminating different areas (14a, 14b) on a mask (4) on which a pattern (6) is formed, an objective lens (OL) disposed to face the mask, and at least a pair of detection optical systems (15, 16) each having a detection sensor (17, 19) to form an image of the pattern and for receiving illumination light from each of the different areas through the objective lens, each of the detection optical systems having a mechanism (13a, 13b) for adjusting an angle of an aperture.
摘要:
An inspection apparatus and method comprising a unit for acquiring an optical image of an object to be inspected by irradiating the object with light, wherein the unit includes a line sensor comprising a plurality of sensors linearly arranged in a row, a generating unit for generating a reference image from design data of the object to be inspected, a comparing unit for comparing the optical image with the reference image, a unit for storing data of three lines acquired by the line sensor, and calculating differences between a gradation value of a pixel on a center line and each gradation value of the eight pixels adjacent to the pixel determining if the pixel is a defect if all of the eight differences of the adjacent pixels are more than a predetermined threshold.