Invention Grant
US07365956B2 Plasma driven, N-type semiconductor, thermoelectric power superoxide ion generator with critical bias conditions 失效
等离子驱动,N型半导体,具有临界偏置条件的热电功率超氧化物离子发生器

  • Patent Title: Plasma driven, N-type semiconductor, thermoelectric power superoxide ion generator with critical bias conditions
  • Patent Title (中): 等离子驱动,N型半导体,具有临界偏置条件的热电功率超氧化物离子发生器
  • Application No.: US11227634
    Application Date: 2005-09-15
  • Publication No.: US07365956B2
    Publication Date: 2008-04-29
  • Inventor: Douglas BurkeSurya G. K. Prakash
  • Applicant: Douglas BurkeSurya G. K. Prakash
  • Main IPC: H01T23/00
  • IPC: H01T23/00
Plasma driven, N-type semiconductor, thermoelectric power superoxide ion generator with critical bias conditions
Abstract:
A plasma is generated inside a barrier enclosure made specifically of N-Type semiconductive material, said plasma thus generating a thermal gradient across said barrier which drives electrons through said barrier via the thermoelectric power of said N-Type semiconductor, said electrons thus being liberated on the opposing side of said barrier where they interact with oxygen in the air to form the superoxide ion, O2−, and a second electrode on said opposing being at a critical minimum negative bias potential to quench collateral production of positive ions and ensuring production only of negative, O2−, ions.
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