发明授权
US07371156B2 Off-line tool for breaking in multiple pad conditioning disks used in a chemical mechanical polishing system
有权
用于打破化学机械抛光系统中使用的多个垫片调节盘的离线工具
- 专利标题: Off-line tool for breaking in multiple pad conditioning disks used in a chemical mechanical polishing system
- 专利标题(中): 用于打破化学机械抛光系统中使用的多个垫片调节盘的离线工具
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申请号: US11507360申请日: 2006-08-21
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公开(公告)号: US07371156B2公开(公告)日: 2008-05-13
- 发明人: Randall J. Lujan
- 申请人: Randall J. Lujan
- 申请人地址: KR Suwon-si US TX Austin
- 专利权人: Samsung Electronics Co., Ltd.,Samsung Austin Semiconductor, L.P.
- 当前专利权人: Samsung Electronics Co., Ltd.,Samsung Austin Semiconductor, L.P.
- 当前专利权人地址: KR Suwon-si US TX Austin
- 主分类号: B24B1/00
- IPC分类号: B24B1/00
摘要:
An off-line tool for breaking in pad conditioning disks used in a chemical mechanical polishing (CMP) system. The off-line tool comprises a platen having a first surface for holding a polishing pad and a motor for rotating the polishing pad. The motor is coupled to the platen via a first drive shaft. The off-line tool further comprises a mechanical drive assembly for holding a second drive shaft in a position proximate the first surface of the platen and a first break-in head removably attached to the second drive shaft. The first break-in head receives a first pad conditioning disk and the second drive shaft moves the first break-in head toward the platen, thereby pressing the first pad conditioning disk against the polishing pad on the platen.