发明授权
- 专利标题: Integrated inspection system and defect correction method
- 专利标题(中): 综合检测系统和缺陷校正方法
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申请号: US11285331申请日: 2005-11-21
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公开(公告)号: US07371590B2公开(公告)日: 2008-05-13
- 发明人: Kevin Patrick Capaldo , Mark Allen Cheverton , Dennis Joseph Coyle , Michael John Davis , Sameer Kirti Talsania , Masako Yamada , Chung-hei Yeung
- 申请人: Kevin Patrick Capaldo , Mark Allen Cheverton , Dennis Joseph Coyle , Michael John Davis , Sameer Kirti Talsania , Masako Yamada , Chung-hei Yeung
- 申请人地址: US NY Schenectady
- 专利权人: General Electric Company
- 当前专利权人: General Electric Company
- 当前专利权人地址: US NY Schenectady
- 代理机构: Cantor Colburn LLP
- 主分类号: H01L21/66
- IPC分类号: H01L21/66
摘要:
A system for the inspection of and a process for the correction of defects in a microreplicated optical display film manufacturing process. The process steps of manufacturing a master, a plurality of shims from the master, and a multiplicity of display films from each shim are integrated with a systemic defect identification and correction process. Each primary manufacturing step has its own inspection system and correction process where defect information for that step of the process is fed back and analyzed; and from that analysis the subprocess is adjusted to eliminate or reduce the detected defect. The systemic defect is identified as to its source and then fed back and analyzed in the correction step of the respective subprocess in order to cure the root of the defect.
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