发明授权
- 专利标题: Thermal wafer processor
- 专利标题(中): 热晶片处理器
-
申请号: US11428742申请日: 2006-07-05
-
公开(公告)号: US07371998B2公开(公告)日: 2008-05-13
- 发明人: Randy A. Harris , Gregory J. Wilson , Paul R. McHugh
- 申请人: Randy A. Harris , Gregory J. Wilson , Paul R. McHugh
- 申请人地址: US MT Kalispell
- 专利权人: Semitool, Inc.
- 当前专利权人: Semitool, Inc.
- 当前专利权人地址: US MT Kalispell
- 代理机构: Perkins Coie LLP
- 代理商 Kenneth H. Ohriner
- 主分类号: F27B5/04
- IPC分类号: F27B5/04 ; F27B5/14 ; F27B11/02 ; F27D3/12 ; F27D1/12
摘要:
A thermal processor may include a cooling jacket positionable around a process chamber within a process vessel or jar. A heater can move into a position substantially between the process chamber vessel and the cooling jacket. A holder having multiple workpiece holding positions is provided for holding a batch or workpieces or wafers. The process chamber vessel is moveable to a position where it substantially encloses the holder, so that wafers in the holder may be processed in a controlled environment. A cooling shroud may be provided to absorb heat from the heater before or after thermal processing. The thermal processor is compact and thermally shielded, and may be used in an automated processing system having other types of processors.
公开/授权文献
- US20080006617A1 THERMAL WAFER PROCESSOR 公开/授权日:2008-01-10
信息查询