发明授权
- 专利标题: Ribbon beam ion implanter cluster tool
- 专利标题(中): 丝带束离子注入机群集工具
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申请号: US11432977申请日: 2006-05-12
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公开(公告)号: US07375355B2公开(公告)日: 2008-05-20
- 发明人: Joseph Ferrara , Patrick R. Splinter , Michael A. Graf , Victor M. Benveniste
- 申请人: Joseph Ferrara , Patrick R. Splinter , Michael A. Graf , Victor M. Benveniste
- 申请人地址: US MA Beverly
- 专利权人: Axcelis Technologies, Inc.
- 当前专利权人: Axcelis Technologies, Inc.
- 当前专利权人地址: US MA Beverly
- 代理机构: Eschweiler & Associates, LLC
- 主分类号: H01J37/317
- IPC分类号: H01J37/317
摘要:
An ion implantation cluster tool for implanting ions into a workpiece is provided, wherein a plurality of beamline assemblies having a respective plurality of ion beamlines associated therewith are positioned about a common process chamber. Each of the plurality of ion beamline assemblies are selectively isolated from the common process chamber, and the plurality of beamline intersect at a processing region of the process chamber. A scanning apparatus positioned within the common process chamber is operable to selectively translate a workpiece holder in one or more directions through each of the plurality of ion beamlines within the processing region, and a common dosimetry apparatus within the common process chamber is operable to measure one or more properties of each of the plurality of ion beamlines. A load lock chamber is operably coupled to the common process chamber for exchange of workpieces between the common process chamber and an external environment.
公开/授权文献
- US20070262271A1 Ribbon beam ion implanter cluster tool 公开/授权日:2007-11-15