发明授权
US07381232B2 Process for producing CeO2 fine particles and polishing slurry containing such fine particles
失效
用于制备CeO 2微粒和含有这种细颗粒的抛光浆料的方法
- 专利标题: Process for producing CeO2 fine particles and polishing slurry containing such fine particles
- 专利标题(中): 用于制备CeO 2微粒和含有这种细颗粒的抛光浆料的方法
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申请号: US11745024申请日: 2007-05-07
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公开(公告)号: US07381232B2公开(公告)日: 2008-06-03
- 发明人: Yoshihisa Beppu , Tomohiro Sakai , Satoshi Kashiwabara , Kazuo Sunahara
- 申请人: Yoshihisa Beppu , Tomohiro Sakai , Satoshi Kashiwabara , Kazuo Sunahara
- 申请人地址: JP Tokyo
- 专利权人: Asahi Glass Company, Limited
- 当前专利权人: Asahi Glass Company, Limited
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权: JP2004-323854 20041108
- 主分类号: B24D3/02
- IPC分类号: B24D3/02 ; C09C1/68 ; C09K3/14
摘要:
To provide a process for producing CeO2 fine particles having high crystallinity, being excellent in uniformity of composition and particle size and having a small particle size, and a polishing slurry containing such fine particles.A process for producing CeO2 fine particles, which comprises a step of obtaining a melt containing, as represented by mol % based on oxides, from 5 to 50% of CeO2, from 10 to 50% of RO (wherein R is at least one member selected from the group consisting of Mg, Ca, Sr and Ba) and from 30 to 75% of B2O3, a step of quenching the melt to obtain an amorphous material, a step of precipitating CeO2 crystals from the amorphous material, and a step of separating the CeO2 crystals from the obtained crystallized product, in this order. A polishing slurry containing from 0.1 to 20 mass % of such fine particles.
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