发明授权
US07381232B2 Process for producing CeO2 fine particles and polishing slurry containing such fine particles 失效
用于制备CeO 2微粒和含有这种细颗粒的抛光浆料的方法

Process for producing CeO2 fine particles and polishing slurry containing such fine particles
摘要:
To provide a process for producing CeO2 fine particles having high crystallinity, being excellent in uniformity of composition and particle size and having a small particle size, and a polishing slurry containing such fine particles.A process for producing CeO2 fine particles, which comprises a step of obtaining a melt containing, as represented by mol % based on oxides, from 5 to 50% of CeO2, from 10 to 50% of RO (wherein R is at least one member selected from the group consisting of Mg, Ca, Sr and Ba) and from 30 to 75% of B2O3, a step of quenching the melt to obtain an amorphous material, a step of precipitating CeO2 crystals from the amorphous material, and a step of separating the CeO2 crystals from the obtained crystallized product, in this order. A polishing slurry containing from 0.1 to 20 mass % of such fine particles.
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