发明授权
US07381519B2 Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same
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顶级抗反射涂料聚合物,其制备方法和包含其的顶部抗反射涂料组合物
- 专利标题: Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same
- 专利标题(中): 顶级抗反射涂料聚合物,其制备方法和包含其的顶部抗反射涂料组合物
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申请号: US11158965申请日: 2005-06-22
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公开(公告)号: US07381519B2公开(公告)日: 2008-06-03
- 发明人: Jae Chang Jung , Cheol Kyu Bok , Chang Moon Lim , Seung Chan Moon
- 申请人: Jae Chang Jung , Cheol Kyu Bok , Chang Moon Lim , Seung Chan Moon
- 申请人地址: KR Gyunggi-do
- 专利权人: Hynix Semiconductor Inc.
- 当前专利权人: Hynix Semiconductor Inc.
- 当前专利权人地址: KR Gyunggi-do
- 代理机构: Marshall, Gerstein & Borun LLP
- 优先权: KR10-2004-0106673 20041215
- 主分类号: G03F7/38
- IPC分类号: G03F7/38 ; G03F7/30 ; G03F7/11 ; G03F7/095
摘要:
Disclosed herein is a top anti-reflective coating polymer and its composition comprising the same represented by Formula 1 below: wherein R1 and R2 are independently, hydrogen, methyl or fluoromethyl; R3 and R4 are independently, a C1-10hydrocarbon or a C1-10 hydrocarbon in which the hydrogen atoms are wholly or partly replaced by fluorine atoms; and a, b, c, d and e represent the mole fraction of each monomer and are in the range between about 0.05 and about 0.9, such that the sum of a, b, c, d, and e equals one.
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