Invention Grant
- Patent Title: Ion beam profiler
- Patent Title (中): 离子束分析仪
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Application No.: US11235754Application Date: 2005-09-27
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Publication No.: US07381977B2Publication Date: 2008-06-03
- Inventor: John D. Pollock , John W. Vanderpot , Donald W. Berrian
- Applicant: John D. Pollock , John W. Vanderpot , Donald W. Berrian
- Applicant Address: US MA Beverly
- Assignee: Axcelis Technologies, Inc.
- Current Assignee: Axcelis Technologies, Inc.
- Current Assignee Address: US MA Beverly
- Agency: Eschweiler & Associates, LLC
- Main IPC: H01J37/317
- IPC: H01J37/317

Abstract:
A system, method, and apparatus for determining a profile of an ion beam are provided. The apparatus comprises a measuring device positioned along a path of the ion beam, a drive mechanism, and a first plate rotatably coupled to the drive mechanism. The drive mechanism is operable to rotate the first plate about a first axis through a path of the ion beam, therein selectively blocking the ion beam from reaching the measuring device. The apparatus may comprise a second plate further rotatably coupled to the drive mechanism, wherein the drive mechanism is operable to rotate the second plate about the first axis through the path of the ion beam independently from the rotation of the first plate, therein further selectively blocking the ion beam from reaching the measuring device. The drive mechanism may further linearly translate first plate and/or second plate through the ion beam.
Public/Granted literature
- US20070069156A1 Ion beam profiler Public/Granted day:2007-03-29
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