中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

20 records (took 0.018 seconds)

    Beam stop and beam tuning methods
    1.
    发明授权
    Beam stop and beam tuning methods 有权
    光束停止和光束调谐方法

    公开(公告)号：US07579604B2

    公开(公告)日：2009-08-25

    申请号：US11445722

    申请日：2006-06-02

    Applicant: John W. Vanderpot ,  Yongzhang Huang

    Inventor： John W. Vanderpot ,  Yongzhang Huang

    IPC: G21K5/10 ,  H01J37/08

    CPC classification number: H01J37/244 ,  H01J37/045 ,  H01J37/09 ,  H01J37/302 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/026 ,  H01J2237/028 ,  H01J2237/30433 ,  H01J2237/31705

    Abstract: A system, method, and apparatus for mitigating contamination associated with ion implantation are provided. An ion source, end station, and mass analyzer positioned between the ion source and the end station are provided, wherein an ion beam is formed from the ion source and selectively travels through the mass analyzer to the end station, based on a position of a beam stop assembly. The beam stop assembly selectively prevents the ion beam from entering and/or exiting the mass analyzer, therein minimizing contamination associated with an unstable ion source during transition periods such as a start-up of the ion implantation system.

    Abstract translation: 提供了用于减轻与离子注入相关的污染的系统，方法和装置。 提供了一种位于离子源和终端之间的离子源，终端站和质量分析器，其中离子源由离子源形成，并且基于位置，选择性地通过质量分析器传送到终端站 光束挡块组件。 光束停止组件选择性地防止离子束进入和/或离开质量分析器，其中最小化在诸如离子注入系统的启动的过渡期间与不稳定离子源相关联的污染。

    Compact load lock system for ion beam processing of foups
    3.
    发明授权
    Compact load lock system for ion beam processing of foups 失效
    用于离子束加工的紧凑型加载锁定系统

    公开(公告)号：US06428262B1

    公开(公告)日：2002-08-06

    申请号：US09637096

    申请日：2000-08-10

    Applicant: John W. Vanderpot ,  John D. Pollock

    Inventor： John W. Vanderpot ,  John D. Pollock

    IPC: B65G4907

    CPC classification number: H01L21/67757 ,  H01L21/67745 ,  H01L21/67754 ,  H01L21/67772 ,  H01L21/67778 ,  H01L21/67781 ,  Y10S414/139

    Abstract: The system processes one or more wafers from a FOUP to an ion processing chamber. A group of wafers from the FOUP is removed by a first end effector and loaded into a load lock through a lower door in an atmosphere opened position. The load lock is sealed, evacuated, and an upper door is opened to a vacuum opened position. A second end effector connected to a 3-axis robot moves one of the wafers from the load lock to the ion processing chamber. A wafer alignment robot can also be used. Wafers are sequentially processed from the load lock to the processing chamber until complete; and then the wafers within the load lock are sealed, pressurized, and moved back to the FOUP. A second load lock, and multiple FOUPs, are used to increase throughput.

    Abstract translation: 该系统处理从FOUP到离子处理室的一个或多个晶片。 来自FOUP的一组晶片被第一端部执行器移除，并通过位于大气打开位置的下门装载到装载锁中。 负载锁被密封，抽真空，并且上门打开到真空打开位置。 连接到3轴机器人的第二端部执行器将一个晶片从负载锁移动到离子处理室。 也可以使用晶片对准机器人。 晶片从负载锁定到处理室，直至完成; 然后加载锁中的晶片被密封，加压并移回FOUP。 使用第二个加载锁和多个FOUP来增加吞吐量。

    Charged beam dump and particle attractor
    5.
    发明授权
    Charged beam dump and particle attractor 有权
    充电束流和吸引子

    公开(公告)号：US07547899B2

    公开(公告)日：2009-06-16

    申请号：US11445677

    申请日：2006-06-02

    Applicant: John W. Vanderpot ,  Yongzhang Huang

    Inventor： John W. Vanderpot ,  Yongzhang Huang

    IPC: G21K5/10 ,  H01J37/08

    CPC classification number: H01J37/244 ,  H01J37/045 ,  H01J37/09 ,  H01J37/302 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/026 ,  H01J2237/028 ,  H01J2237/30433 ,  H01J2237/31705

    Abstract: A system, method, and apparatus for mitigating contamination during ion implantation are provided. An ion source, end station, and mass analyzer positioned between the ion source and the end station are provided, wherein an ion beam is formed from the ion source and travels through the mass analyzer to the end station. An ion beam dump assembly comprising a particle collector, particle attractor, and shield are associated with the mass analyzer, wherein an electrical potential of the particle attractor is operable to attract and constrain contamination particles within the particle collector, and wherein the shield is operable to shield the electrical potential of the particle attractor from an electrical potential of an ion beam within the mass analyzer.

    Abstract translation: 提供了一种用于减少离子注入期间污染的系统，方法和装置。 提供了位于离子源和终端之间的离子源，端站和质量分析器，其中离子束由离子源形成并通过质量分析器传送到终端站。 包括粒子收集器，颗粒吸引子和屏蔽的离子束转储组件与质量分析器相关联，其中，所述粒子吸引子的电位可操作以吸引和约束所述颗粒收集器内的污染颗粒，并且其中所述屏蔽件可操作为 屏蔽质子分析仪内离子束电位的吸引子的电位。

    Method for reciprocating a workpiece through an ion beam
    6.
    发明授权
    Method for reciprocating a workpiece through an ion beam 有权
    通过离子束使工件往复运动的方法

    公开(公告)号：US07141809B2

    公开(公告)日：2006-11-28

    申请号：US11099062

    申请日：2005-04-05

    Applicant: John W. Vanderpot ,  John D. Pollock ,  Donald W. Berrian

    Inventor： John W. Vanderpot ,  John D. Pollock ,  Donald W. Berrian

    IPC: B65H1/00

    CPC classification number: H01J37/20 ,  H01J37/3171 ,  H01J2237/0216 ,  H01J2237/20228 ,  H01J2237/20292 ,  H01J2237/31703 ,  H01L21/67069 ,  H01L21/67259 ,  H01L21/68764 ,  H01L21/68792

    Abstract: A method for reciprocally transporting a workpiece on a scan arm through an ion beam is provided, wherein the scan arm is operably coupled to a motor comprising a rotor and stator that are individually rotatable about a first axis. An electromagnetic force applied between the rotor and stator rotates the rotor about the first axis and translates the workpiece through the ion beam along a first scan path. A position of the workpiece is sensed and the electromagnetic force between the rotor and stator is controlled in order to reverse the direction of motion of the workpiece along the first scan path, and wherein the control is based, at least in part, on the sensed position of the workpiece. The stator further rotates about the first axis in reaction to the rotation of the rotor, particularly in the reversal of direction of motion of the workpiece, thus acting as a reaction mass to the rotation of one or more of the rotor, scan arm, and workpiece.

    Abstract translation: 提供了一种用于通过离子束在扫描臂上往复运送工件的方法，其中扫描臂可操作地耦合到包括转子和定子的电动机，该转子和定子可以围绕第一轴线单独旋转。 施加在转子和定子之间的电磁力围绕第一轴线旋转转子，并使工件沿第一扫描路径平移离子束。 感测工件的位置，并且控制转子和定子之间的电磁力以便沿着第一扫描路径反转工件的运动方向，并且其中控制至少部分地基于感测的 工件位置。 定子进一步围绕第一轴线转动，以反应转子的旋转，特别是在反转工件的运动方向上，从而作为与转子，扫描臂和转子中的一个或多个的旋转反应的质量 工件。

    Hybrid scanning system and methods for ion implantation
    7.
    发明授权
    Hybrid scanning system and methods for ion implantation 失效
    混合扫描系统和离子注入方法

    公开(公告)号：US06765219B2

    公开(公告)日：2004-07-20

    申请号：US09990848

    申请日：2001-11-21

    Applicant: Donald W. Berrian ,  John D. Pollock ,  John W. Vanderpot

    Inventor： Donald W. Berrian ,  John D. Pollock ,  John W. Vanderpot

    IPC: H01J3700

    CPC classification number: H01J37/3171 ,  H01J2237/20207 ,  H01J2237/20228 ,  H01J2237/304

    Abstract: An ion implantation system contains, in the ion implantation chamber, a workpiece holder that scans vertically while tilting a wafer at an angle of rotation that is rotated out of a perpendicular orientation with respect to the axis of projection in an ion beam. The implant angle into an implant surface on wafer that is retained by the workpiece holder is adjusted by selective rotation of the workpiece holder about its path of motion. A Faraday cup scans the ion beam along the intended location of the implant surface to form a setup measurement plane. The ion beam quality is adjusted to enhance beam uniformity along the setup plane according to these tilt-angle measurements. A charge neutralizing device, such as a flood gun, is moved in operational alignment with the workpiece.

    Abstract translation: 离子注入系统在离子注入室中包含垂直扫描的工件保持器，同时以相对于离子束中的突出轴线的垂直取向旋转的旋转角度倾斜晶片。 通过工件保持器围绕其运动路径的选择性旋转来调节进入工件保持器所保持的晶片上植入物表面的植入角度。 法拉第杯沿着植入物表面的预期位置扫描离子束以形成设置测量平面。 根据这些倾斜角测量，调整离子束质量以提高沿着设置平面的光束均匀性。 电荷中和装置，例如喷枪，与工件运动对准地移动。

    Scanning system with linear gas bearings and active counter-balance options
    8.
    发明授权
    Scanning system with linear gas bearings and active counter-balance options 有权
    带线性气体轴承和主动平衡选项的扫描系统

    公开(公告)号：US06172372B2

    公开(公告)日：2001-01-09

    申请号：US09132726

    申请日：1998-08-12

    Applicant: John W. Vanderpot

    Inventor： John W. Vanderpot

    IPC: H01J3730

    CPC classification number: F04D19/04 ,  F04D29/057 ,  H01J37/20 ,  H01J2237/20228 ,  H01J2237/31701

    Abstract: An ion beam scanning system includes an ion beam processing chamber and a shaft extending through two opposing walls of the chamber. Linear gas bearings couple the shaft through the walls to provide for rotational and linear movement of the shaft. An ion source and scanning unit generates an ion beam and scans a workpiece mounted on the shaft. The ion beam irradiates the workpiece at a selected angle, relative to the surface normal of the workpiece, defined by rotation of the shaft. A linear drive linearly moves the shaft so that the ion beam creates a raster pattern on the workpiece. The system can include counter-balancing of the shaft to ease the work of the drive units. Batch processing can be achieved through a rotatable disc mounted to the shaft, whereby each workpiece is processed by rotation of the disc and simultaneous linear motion of the shaft. One processing system can also include two mounting structures, one for loading/unloading during simultaneous processing of workpieces on another structure.

    Abstract translation: 离子束扫描系统包括离子束处理室和延伸穿过腔室的两个相对壁的轴。 线性气体轴承通过壁连接轴，以提供轴的旋转和线性运动。 离子源和扫描单元产生离子束并扫描安装在轴上的工件。 离子束相对于通过轴的旋转限定的工件的表面法线以选定的角度照射工件。 线性驱动器直线地移动轴，使得离子束在工件上产生光栅图案。 该系统可以包括轴的平衡平衡以便驱动单元的工作。 可以通过安装到轴的可旋转盘来实现批处理，由此通过盘的旋转和轴的同时线性运动来处理每个工件。 一个处理系统还可以包括两个安装结构，一个用于在另一结构上同时处理工件期间的装载/卸载。

    Method and apparatus for high efficiency scanning in an ion implanter
    9.
    发明授权
    Method and apparatus for high efficiency scanning in an ion implanter 失效
    用于离子注入机高效扫描的方法和装置

    公开(公告)号：US4980562A

    公开(公告)日：1990-12-25

    申请号：US432470

    申请日：1989-11-07

    Applicant: Donald W. Berrian ,  Robert E. Kaim ,  John W. Vanderpot

    Inventor： Donald W. Berrian ,  Robert E. Kaim ,  John W. Vanderpot

    IPC: C23C14/48 ,  H01J37/147 ,  H01J37/317 ,  H01L21/265

    CPC classification number: H01J37/147 ,  H01J37/3171

    Abstract: An ion beam scanning method and apparatus produce a parallel, scanned ion beam with a magnetic deflector having, in one instance, wedge-shaped pole pieces that develop a uniform magnetic field. A beam accelerator for the scanned beam has a slot-shaped passage which the scanned beam traverses. The beam scan and the beam traverse over a target object are controlled to attain a selected beam current and corresponding ion dose on a target object. Methods and apparatus are disclosed for increasing ion beam utilization efficiency without adversely effecting dose accuracy.

    Abstract translation: 离子束扫描方法和装置产生具有磁导流器的平行扫描离子束，其一方面具有形成均匀磁场的楔形极片。 用于扫描光束的光束加速器具有扫描光束穿过的槽形通道。 控制光束扫描和横越目标物体的光束，以获得目标对象上的选定光束电流和相应的离子剂量。 公开了用于提高离子束利用效率而不会不利地影响剂量精度的方法和装置。

    Substrate positioning system
    10.
    发明授权
    Substrate positioning system 失效
    基板定位系统

    公开(公告)号：US06777687B2

    公开(公告)日：2004-08-17

    申请号：US10153114

    申请日：2002-05-21

    Applicant: John W. Vanderpot ,  Donald W. Berrian ,  John D. Pollock

    Inventor： John W. Vanderpot ,  Donald W. Berrian ,  John D. Pollock

    IPC: H01J3720

    CPC classification number: H01L21/68764 ,  H01J37/3171 ,  H01J2237/20 ,  H01L21/68

    Abstract: A substrate positioning system is provided to facilitate the performing of certain processing on the substrate, such as ion implantation. The system comprises a linkage rotatably mounted to a base and an end effector member rotatably mounted to the linkage and configured for receiving a substrate. Through the synchronized rotation of the linkage about the base and the end effector member about the linkage, the system acts as a robotic unit to move the substrate to the desired location for performing processing thereon. In another aspect, the base is movable along an axis such that the system maintains a constant distance of travel for an ion beam incident on the substrate as the linkage and end effector member travel in a curved path.

    Abstract translation: 提供衬底定位系统以便于在衬底上执行某些处理，例如离子注入。 该系统包括可旋转地安装到基座的连接件和可旋转地安装到连杆机构并构造成用于接收基板的端部执行器部件。 通过围绕连杆机构围绕底座和端部执行器部件的联动的同步旋转，该系统充当机器人单元以将基板移动到期望的位置以在其上进行处理。 在另一方面，基座可以沿轴线移动，使得当连接件和端部执行器部件在弯曲的路径中行进时，系统保持入射在基板上的离子束的恒定的行进距离。

Patent Agency Ranking