发明授权
US07382436B2 Mirror, lithographic apparatus, device manufacturing method, and device manufactured thereby
有权
镜面，光刻设备，器件制造方法以及由此制造的器件
- 专利标题： Mirror, lithographic apparatus, device manufacturing method, and device manufactured thereby
- 专利标题（中）： 镜面，光刻设备，器件制造方法以及由此制造的器件
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申请号： US10887306申请日： 2004-07-09
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公开(公告)号： US07382436B2公开(公告)日： 2008-06-03
- 发明人: Levinus Pieter Bakker
- 申请人： Levinus Pieter Bakker
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 优先权： EP03077155 20030709
- 主分类号： G03B27/54
- IPC分类号： G03B27/54 ; G03B27/42 ; G02B17/00
摘要：
A mirror has a mirror surface, wherein the mirror surface includes a protrusion including a material selected from at least one of Be, B, C, P, S, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Nb, Mo, Ba, La, Ce, Pr, Pa and U, or a first protrusion including a first material selected from at least one of Be, B, C, P, S, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Nb, Mo, Ba, La, Ce, Pr, Pa and U, and a second protrusion including a second material selected from at least one of Be, B, C, Si, P, S, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Nb, Mo, Ba, La, Ce, Pr, Pa and U, and the first and second materials are not the same. A lithographic projection apparatus includes such a mirror. A device manufacturing method includes reflecting a beam of radiation by use of such a mirror. A device is manufactured according to the method.
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