公开(公告)号：US20120273697A1

公开(公告)日：2012-11-01

申请号：US13517368

申请日：2011-01-04

申请人： Jun She ,  Levinus Pieter Bakker ,  Cornelis Reinder Ronda

发明人： Jun She ,  Levinus Pieter Bakker ,  Cornelis Reinder Ronda

IPC分类号： G01N21/25 ,  G01N21/64 ,  B82Y20/00

CPC分类号： G01N33/1826 ,  C02F2201/326 ,  G01N21/293 ,  G01N21/33

摘要： To overcome the disadvantages introduced by using UV sensors to detect the intensity of UV light in water purification apparatuses, the present invention provides a novel detection apparatus to “visualize” the quality of water in the form of visible light, instead of digitizing the intensity of UV light. The detection apparatus comprises a first detection window, coated with a first material for converting a received first ultraviolet light into a first visible light, wherein the first ultraviolet light is emitted from an ultraviolet light source and traverses the liquid, and the apparatus further mixes the first visible light with a second visible light to generate a third visible light. The different color of the third visible light can represent the different quality of the water.

摘要翻译： 为了克服通过使用UV传感器来检测水净化装置中的紫外线的强度的缺点，本发明提供了一种新颖的检测装置，以可见光的形式观察水的质量，而不是将UV光的强度数字化 。 该检测装置包括第一检测窗口，涂覆有用于将接收的第一紫外光转换成第一可见光的第一材料，其中第一紫外光从紫外光源发射并穿过液体，并且该装置进一步混合 第一可见光具有第二可见光以产生第三可见光。 第三可见光的不同颜色可以代表不同的水质。

公开(公告)号：US20110121177A1

公开(公告)日：2011-05-26

申请号：US13021226

申请日：2011-02-04

申请人： Vadim Yevgenyevich BANINE ,  Levinus Pieter Bakker ,  Ralph Kurt ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Peter Cornelis Zalm

发明人： Vadim Yevgenyevich BANINE ,  Levinus Pieter Bakker ,  Ralph Kurt ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Peter Cornelis Zalm

IPC分类号： G01N23/08

CPC分类号： G01N25/142 ,  G01N25/68 ,  Y10T436/25875

摘要： A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.

摘要翻译： 一种用于检测光刻设备的内部空间中的至少一种污染物质的系统，包括：被配置为与所述内部空间接触的至少一个监测表面;被配置为将所述监测表面的温度控制在至少 一个检测温度，以及至少一个检测器，被配置为检测所述至少一种污染物质到所述监测表面上的冷凝。

公开(公告)号：US07706057B2

公开(公告)日：2010-04-27

申请号：US12230384

申请日：2008-08-28

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

IPC分类号： F21V9/04 ,  F21V9/06 ,  G02B5/08 ,  G02B5/20

CPC分类号： G02B1/10 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/283 ,  G03F1/24 ,  G03F7/70575 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067

摘要： A multi-layer mirror includes a multi-layer stack. The multi-layer stack includes a plurality of alternating layers with a multi-layer stack top layer and a spectral filter top layer arranged on the multi-layer stack. The spectral filter top layer includes a first spectral purity enhancement layer that includes a first material m1 and has a first layer thickness d1, an intermediate layer that includes a second material m2 and has a second layer thickness d2. The intermediate layer is arranged on the multi-layer stack top layer. The first material is selected from SiN, Si3N4, SiO2, ZnS, Te, diamond, CsI, Se, SiC, amorphous carbon, MgF2, CaF2, TiO2, Ge, PbF2, ZrO2, BaTiO3, LiF or NaF. The second material includes a material different from the first material, and d1+d2 has a thickness between 1.5 and 40 nm.

摘要翻译： 多层反射镜包括多层堆叠。 多层堆叠包括多层交叠层，多层叠层顶层和布置在多层堆叠上的光谱过滤器顶层。 光谱过滤器顶层包括第一光谱纯度增强层，其包括第一材料m1并且具有第一层厚度d1，包括第二材料m2并具有第二层厚度d2的中间层。 中间层布置在多层堆叠顶层上。 第一种材料选自SiN，Si3N4，SiO2，ZnS，Te，金刚石，CsI，Se，SiC，无定形碳，MgF2，CaF2，TiO2，Ge，PbF2，ZrO2，BaTiO3，LiF或NaF。 第二材料包括与第一材料不同的材料，并且d1 + d2具有在1.5和40nm之间的厚度。

公开(公告)号：US07671973B2

公开(公告)日：2010-03-02

申请号：US10596564

申请日：2004-12-16

申请人： Michael Cornelis Van Beek ,  Frank Jeroen Pieter Schuurmans ,  Levinus Pieter Bakker

发明人： Michael Cornelis Van Beek ,  Frank Jeroen Pieter Schuurmans ,  Levinus Pieter Bakker

IPC分类号： G01N33/48

CPC分类号： A61B5/1455 ,  A61B5/14532 ,  A61B5/14546 ,  A61B5/14552 ,  G01J3/36 ,  G01N21/65 ,  G01N33/49

摘要： The present invention provides an optical analysis system for determining an amplitude of a principal component of an optical signal. The principal component is indicative of the concentration of a particular compound or various compounds of a substance that is subject to spectroscopic analysis. The optical signal is subject to wavelength selective weighting and wavelength selective spatial separation specified by a weighting function. The optical signal is preferably separated into two parts that corresponding to a positive and negative spectral band of the weighting function, respectively. The separation provides separate detection of the separated parts of the optical signal without significant loss of intensity, thereby providing an improved signal to noise ratio of the determined principal component. Separation and weighting of the optical signal is realized by two multivariate optical elements.

摘要翻译： 本发明提供了一种用于确定光信号的主分量的幅度的光学分析系统。 主要成分指示特定化合物或受光谱分析的物质的各种化合物的浓度。 光信号经受由加权函数指定的波长选择加权和波长选择性空间分离。 光信号优选分为对应于加权函数的正和负光谱带的两部分。 分离提供对光信号的分离部分的单独检测，而没有明显的强度损失，从而提供确定的主要分量的改善的信噪比。 光信号的分离和加权由两个多元光学元件实现。

公开(公告)号：US07508487B2

公开(公告)日：2009-03-24

申请号：US10719065

申请日：2003-11-24

申请人： Johannes Catharinus Hubertus Mulkens ,  Paul Van Der Veen ,  Willem Van Schaik ,  Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Heine Melle Mulder

发明人： Johannes Catharinus Hubertus Mulkens ,  Paul Van Der Veen ,  Willem Van Schaik ,  Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Heine Melle Mulder

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70558 ,  G03F7/70883 ,  G03F7/70933 ,  G03F7/70941

摘要： In a lithographic projection system, the radiation energy delivered to the substrate needs to be accurately controlled. Attenuation by injecting an absorbent gas into a volume through which the radiation passes is a convenient way to control the energy. Additionally, the interaction between gasses and the radiation may be used to measure the energy of the radiation with minimal disruption to the radiation.

摘要翻译： 在光刻投影系统中，需要准确地控制传送到基板的辐射能量。 通过将吸收气体注入到辐射通过的体积中的衰减是控制能量的便利方式。 此外，气体和辐射之间的相互作用可用于以最小的辐射破坏来测量辐射的能量。

公开(公告)号：US20090040610A1

公开(公告)日：2009-02-12

申请号：US11572008

申请日：2005-07-11

申请人： Sjoerd Stallinga ,  Levinus Pieter Bakker

发明人： Sjoerd Stallinga ,  Levinus Pieter Bakker

IPC分类号： G02B27/28

CPC分类号： G03F7/70566 ,  Y10S359/90

摘要： A method and an apparatus for generating a polarized light beam to be projected onto an object plane are provided. A converging or diverging light beam (18) is generated. The converging or diverging light beam is projected through a member (22, 52) comprising an uniaxial birefringent material, the uniaxial birefringent material having a symmetry axis essentially parallel to the optical axis (12) of the light beam, and the member being placed at a distance from the object plane. Thereby, it is possible to create, for example a radially polarized beam that can be used for various optical purposes, e.g. for optical data reading/writing or for microscopy.

摘要翻译： 提供一种用于产生投影到物平面上的偏振光束的方法和装置。 产生会聚或发散的光束（18）。 会聚或发散的光束通过包括单轴双折射材料的构件（22,52）投影，单轴双折射材料具有基本上平行于光束的光轴（12）的对称轴，并且该构件被放置在 距物体平面的距离。 因此，可以产生例如可以用于各种光学目的的径向偏振光束，例如， 用于光学数据读取/写入或用于显微镜。

公开(公告)号：US20080309941A1

公开(公告)日：2008-12-18

申请号：US12094802

申请日：2006-11-20

申请人： Martinus Bernardus Van Der Mark ,  Michael Cornelis Van Beek ,  Levinus Pieter Bakker

发明人： Martinus Bernardus Van Der Mark ,  Michael Cornelis Van Beek ,  Levinus Pieter Bakker

IPC分类号： G01N21/00

CPC分类号： G01N21/4795 ,  G01N2021/1787 ,  G01N2021/4766 ,  G01N2021/6439

摘要： The invention relates to a method of imaging an interior of a turbid medium (45) comprising the following steps: accommodation of the turbid medium (45) inside a receiving volume; coupling transmission input light (65) from a transmission light source into the receiving volume, with said transmission input light (65) being chosen such that it is capable of propagating through the turbid medium (45); detection of transmission output light emanating from the receiving volume as a result of coupling transmission input light from the light source into the receiving volume through use of a transmission photodetector unit. The invention also relates to a system for imaging an interior of a turbid medium (45) and to a medical image acquisition system both using the method. The method, system, and medical image acquisition system are adapted such that an improved way of obtaining data relating to the exterior of the turbid medium (45) is realized. The object of the invention is realized in that the method further comprises the following steps:—coupling geometry input light (70, 75, 80) from a geometry light source into the receiving volume, with the receiving volume comprising the turbid medium (45) and with the combination of the geometry input light (70, 75, 80) and the interface (60) being chosen for creating a contrast between the turbid medium (45) and its surroundings; detection of the contrast (60) between the turbid medium (45) and its surroundings through use of a contrast photodetector unit; reconstructing an image of an interior of the turbid medium (45) using a the detected contrast (60). The system for imaging an interior of a turbid medium (45) and the medical image acquisition device are adapted to further comprise a geometry light source and a contrast photodetector unit.

公开(公告)号：US20080212053A1

公开(公告)日：2008-09-04

申请号：US10962744

申请日：2004-10-13

申请人： Joost Jeroen Ottens ,  Levinus Pieter Bakker ,  Wilhelmus Josephus Box ,  Jan Van Elp ,  Frank Jeroen Pieter Schuurmans ,  Jan Evert Van Der Werf

发明人： Joost Jeroen Ottens ,  Levinus Pieter Bakker ,  Wilhelmus Josephus Box ,  Jan Van Elp ,  Frank Jeroen Pieter Schuurmans ,  Jan Evert Van Der Werf

IPC分类号： G03B27/42 ,  G03F7/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70425 ,  G03F7/70433 ,  H01J37/3026 ,  H01J2237/31764

摘要： A device manufacturing method is disclosed. The method includes patterning a beam of radiation, projecting the patterned beam of radiation onto a plurality of outer target portions of a substrate in a sequence in which each subsequent outer target portion is spaced-apart from a preceding outer target portion, and subsequent to projecting the patterned beam of radiation on the plurality of outer target portions, projecting the patterned beam of radiation onto an inner target portion of the substrate.

摘要翻译： 公开了一种装置制造方法。 该方法包括图案化辐射束，将图案化的辐射束投射到基板的多个外部目标部分上，其中每个后续的外部目标部分与先前的外部目标部分间隔开，并且随后突出 所述图案化的辐射束在所述多个外部目标部分上，将所述图案化的辐射束投射到所述衬底的内部目标部分上。

公开(公告)号：US07405804B2

公开(公告)日：2008-07-29

申请号：US10958666

申请日：2004-10-06

申请人： Levinus Pieter Bakker

发明人： Levinus Pieter Bakker

IPC分类号： G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70191 ,  G03F7/70575

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support configured to support a patterning device, the patterning device being configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table configured to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the radiation beam is reflected from at least one grazing incidence mirror that enhances the spectral purity of the radiation beam.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 被配置为支撑图案形成装置的支撑件，所述图案形成装置被构造成在其横截面中赋予所述辐射束图案以形成图案化的辐射束; 被配置为保持基板的基板台; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上，其中所述辐射束从至少一个掠入射镜反射，所述掠入射镜增强了所述辐射束的光谱纯度。

公开(公告)号：US20080054189A1

公开(公告)日：2008-03-06

申请号：US11512432

申请日：2006-08-30

申请人： Johannes Hubertus Josephina Moors ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

发明人： Johannes Hubertus Josephina Moors ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G03F7/20

CPC分类号： G03F7/70916 ,  G03F7/70983

摘要： A lithographic apparatus includes a radiation source configured to emit radiation to form a radiation beam, the radiation being of a type which can create plasma in a low pressure environment in the apparatus, and an optical component configured to condition the radiation beam, impart the conditioned radiation beam with a pattern in its cross-section to form a patterned radiation beam, project the patterned radiation beam onto a target portion of a substrate, and/or to detect radiation. The optical component is provided with a plasma quenching structure, the plasma quenching structure being configured to provide electron-ion recombination in, on and/or near the optical component.

摘要翻译： 光刻设备包括被配置为发射辐射以形成辐射束的辐射源，该辐射是能够在该设备中的低压环境中产生等离子体的类型，以及配置成调节辐射束的光学部件， 辐射束在其横截面上具有图案以形成图案化的辐射束，将图案化的辐射束投影到衬底的目标部分上和/或检测辐射。 光学部件设置有等离子体淬火结构，等离子体淬火结构被配置为在光学部件的内部和/或附近提供电子 - 离子复合。