Invention Grant
- Patent Title: Micromachining process, system and product
- Patent Title (中): 微机加工，系统和产品
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Application No.: US11256213Application Date: 2005-10-24
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Publication No.: US07385209B2Publication Date: 2008-06-10
- Inventor: Samuel Jaccard , Serguei Mikhailov , Frans Munnik
- Applicant: Samuel Jaccard , Serguei Mikhailov , Frans Munnik
- Applicant Address: CH Neuchatel
- Assignee: Haute Ecole Arc Ne-Be-Ju
- Current Assignee: Haute Ecole Arc Ne-Be-Ju
- Current Assignee Address: CH Neuchatel
- Agency: Blank Rome LLP
- Priority: EP03009333 20030424
- Main IPC: G01N23/00
- IPC: G01N23/00 ; G21K7/00
Abstract:
Ion beam lithography technique wherein a higher amount of radiation energy is deposited to predetermined regions in the bulk if a suitable substrate. By selecting the radiation nature, its energy and the irradiation parameters a structure can be created in the bulk of the material leaving the surface essentially untouched.
Public/Granted literature
- US20060214105A1 Micromachining process, system and product Public/Granted day:2006-09-28
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