发明授权
- 专利标题： Lithographic apparatus, cleaning system and cleaning method for in situ removing contamination from a component in a lithographic apparatus
- 专利标题（中）： 平版印刷设备，清洁系统和用于原位去除光刻设备中部件污染的清洁方法
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申请号： US10957754申请日： 2004-10-05
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公开(公告)号： US07385670B2公开(公告)日： 2008-06-10
- 发明人: Rene Theodorus Petrus Compen , Joost Jeroen Ottens
- 申请人： Rene Theodorus Petrus Compen , Joost Jeroen Ottens
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman, LLP
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03B27/32
摘要：
A lithographic apparatus is disclosed. The apparatus includes a cleaning system for cleaning a component in the lithographic apparatus in situ. The cleaning system is arranged to provide a cleaning environment in proximity of a predetermined position on a component to be cleaned. The system is also arranged to provide the cleaning environment substantially independent of a type of contamination present at the predetermined position.
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