Invention Grant
US07387988B2 Thinner composition and method of removing photoresist using the same
有权
较薄的组成和使用其去除光致抗蚀剂的方法
- Patent Title: Thinner composition and method of removing photoresist using the same
- Patent Title (中): 较薄的组成和使用其去除光致抗蚀剂的方法
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Application No.: US11049751Application Date: 2005-02-04
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Publication No.: US07387988B2Publication Date: 2008-06-17
- Inventor: Seung-Hyun Ahn , Eun-Mi Bae , Baik-Soon Choi , Sang-Mun Chon , Dae-Joung Kim , Kwang-Sub Yoon , Sang-Kyu Park , Jae-Ho Kim , Shi-Yong Yi , Kyoung-Mi Kim , Yeu-Young Youn
- Applicant: Seung-Hyun Ahn , Eun-Mi Bae , Baik-Soon Choi , Sang-Mun Chon , Dae-Joung Kim , Kwang-Sub Yoon , Sang-Kyu Park , Jae-Ho Kim , Shi-Yong Yi , Kyoung-Mi Kim , Yeu-Young Youn
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Volentine & Whitt, PLLC
- Priority: KR10-2004-0008678 20040210
- Main IPC: C11D7/50
- IPC: C11D7/50
Abstract:
A thinner composition includes propylene glycol ether acetate, methyl 2-hydroxy-2-methyl propionate, and an ester compound such as ethyl lactate, ethyl 3-ethoxy propionate or a mixture thereof.
Public/Granted literature
- US20050176607A1 Thinner composition and method of removing photoresist using the same Public/Granted day:2005-08-11
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