Invention Grant
- Patent Title: EUV light source
- Patent Title (中): EUV光源
-
Application No.: US11646938Application Date: 2006-12-27
-
Publication No.: US07388220B2Publication Date: 2008-06-17
- Inventor: Igor V. Fomenkov , Alexander I. Ershov
- Applicant: Igor V. Fomenkov , Alexander I. Ershov
- Applicant Address: US CA San Diego
- Assignee: Cymer, Inc.
- Current Assignee: Cymer, Inc.
- Current Assignee Address: US CA San Diego
- Agent William C. Cray
- Main IPC: H01J35/20
- IPC: H01J35/20
Abstract:
An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site.
Public/Granted literature
- US20070125970A1 EUV light source Public/Granted day:2007-06-07
Information query
