发明授权
US07390683B2 Method of manufacturing a semiconductor device including a slab layer with a periodic air hole structure and a linear defect region 有权
制造半导体器件的方法,该半导体器件包括具有周期性空气孔结构的板层和线性缺陷区域

Method of manufacturing a semiconductor device including a slab layer with a periodic air hole structure and a linear defect region
摘要:
A semiconductor device has a two-dimensional slab photonic crystal structure in which a substrate supports a sheet-like slab layer including, sequentially stacked, a lower cladding layer, an active layer, and an upper cladding layer. A periodic refractive index profile structure, in surfaces of the stacked layers, introduces a linear defect region that serves as a waveguide. A p-type region and an n-type region in the slab layer define a pn junction surface at a predetermined angle with respect to the surfaces of the stacked layers in the slab layer.
公开/授权文献
信息查询
0/0