- 专利标题: Apparatus for generating a plurality of beamlets
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申请号: US11544980申请日: 2006-10-06
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公开(公告)号: US07391037B2公开(公告)日: 2008-06-24
- 发明人: Pieter Kruit
- 申请人: Pieter Kruit
- 申请人地址: NL
- 专利权人: Mapper Lithography IP B.V.
- 当前专利权人: Mapper Lithography IP B.V.
- 当前专利权人地址: NL
- 代理机构: Blakely, Soskoloff, Taylor & Zafman
- 主分类号: H01J37/317
- IPC分类号: H01J37/317 ; H01J37/147 ; H01J37/26
摘要:
The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means.In this way, it is possible to reduce aberrations of the converging means.
公开/授权文献
- US20070029499A1 Apparatus for generating a plurality of beamlets 公开/授权日:2007-02-08
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