Invention Grant
US07394067B1 Systems and methods for reducing alteration of a specimen during analysis for charged particle based and other measurement systems
有权
用于减少基于带电粒子和其他测量系统的分析期间样品变化的系统和方法
- Patent Title: Systems and methods for reducing alteration of a specimen during analysis for charged particle based and other measurement systems
- Patent Title (中): 用于减少基于带电粒子和其他测量系统的分析期间样品变化的系统和方法
-
Application No.: US11185915Application Date: 2005-07-20
-
Publication No.: US07394067B1Publication Date: 2008-07-01
- Inventor: David Soltz , Paul Wieczorek , Aaron Zuo , Gabor Toth
- Applicant: David Soltz , Paul Wieczorek , Aaron Zuo , Gabor Toth
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Technologies Corp.
- Current Assignee: KLA-Tencor Technologies Corp.
- Current Assignee Address: US CA Milpitas
- Agency: Baker & McKenzie LLP
- Main IPC: G01B15/04
- IPC: G01B15/04
Abstract:
Systems and methods for reducing alteration of a specimen during by charged particle based and other measurements systems are provided. One system configured to reduce alteration of a specimen during analysis includes a vacuum chamber in which the specimen is disposed during the analysis and an element disposed within the vacuum chamber. A surface of the element is cooled such that molecules in the vacuum chamber are adsorbed onto the surface and cannot cause alteration of a characteristic of the specimen during the analysis. One system configured to analyze a specimen includes an analysis subsystem configured to analyze the specimen while the specimen is disposed in a vacuum chamber and an element disposed within the vacuum chamber. A surface of the element is cooled such that molecules in the vacuum chamber are adsorbed onto the surface and cannot cause alteration of a characteristic of the specimen during the analysis.
Information query
