Invention Grant
- Patent Title: Micro column electron beam apparatus formed in low temperature co-fired ceramic substrate
- Patent Title (中): 微柱电子束装置形成于低温共烧陶瓷基片中
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Application No.: US11260025Application Date: 2005-10-24
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Publication No.: US07394071B2Publication Date: 2008-07-01
- Inventor: Dae Jun Kim , Jin Woo Jeong , Sang Kuk Choi , Dae Yong Kim , Ho Seob Kim
- Applicant: Dae Jun Kim , Jin Woo Jeong , Sang Kuk Choi , Dae Yong Kim , Ho Seob Kim
- Applicant Address: KR Daejeon
- Assignee: Electronics and Telecommunications Research Institute
- Current Assignee: Electronics and Telecommunications Research Institute
- Current Assignee Address: KR Daejeon
- Agency: Blakely, Sokoloff, Taylor & Zafman LLP
- Priority: KR10-2004-0109003 20041220; KR10-2005-0049196 20050609
- Main IPC: H01J37/304
- IPC: H01J37/304
Abstract:
A micro column electron beam apparatus having a reduced number of interconnections is provided. The micro column electron beam apparatus includes: a low temperature co-fired ceramic (LTCC) substrate; a plurality of deflector electrodes attached to a predetermined top portion of the LTCC substrate; a pad electrode placed at a top edge of the LTCC substrate and transmitting an external signal to the deflector electrodes; and a connection unit placed in the LTCC substrate and electrically connecting the deflector electrode and the pad electrode.
Public/Granted literature
- US20060131752A1 Micro column electron beam apparatus formed in low temperature co-fired ceramic substrate Public/Granted day:2006-06-22
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