发明授权
US07397056B2 Lithographic apparatus, contaminant trap, and device manufacturing method
失效
平版印刷设备，污染物捕集器和器件制造方法
- 专利标题： Lithographic apparatus, contaminant trap, and device manufacturing method
- 专利标题（中）： 平版印刷设备，污染物捕集器和器件制造方法
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申请号： US11175036申请日： 2005-07-06
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公开(公告)号： US07397056B2公开(公告)日： 2008-07-08
- 发明人: Leonid Aizikovitch Sjmaenok , Vadim Yevgenyevich Banine , Josephus Jacobus Smits , Lambertus Adrianus Van De Wildenberg , Alexander Alexandrovitch Schmidt , Arnoud Cornelis Wassink , Eric Louis Willem Verpalen , Antonius Johannes Van De Pas
- 申请人： Leonid Aizikovitch Sjmaenok , Vadim Yevgenyevich Banine , Josephus Jacobus Smits , Lambertus Adrianus Van De Wildenberg , Alexander Alexandrovitch Schmidt , Arnoud Cornelis Wassink , Eric Louis Willem Verpalen , Antonius Johannes Van De Pas
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman, LLP
- 主分类号： H01J65/04
- IPC分类号： H01J65/04
摘要：
A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels which are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates are oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap is provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.
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