公开(公告)号：US07612353B2

公开(公告)日：2009-11-03

申请号：US11481252

申请日：2006-07-06

申请人： Leonid Aizikovitch Sjmaenok ,  Vadim Yevgenyevich Banine ,  Josephus Jacobus Smits ,  Lambertus Adrianus Van Den Wildenberg ,  Alexander Alexandrovitch Schmidt ,  Arnoud Cornelis Wassink ,  Eric Louis Willem Verpalen ,  Antonius Johannes Van De Pas ,  Paul Peter Anna Antonius Brom

发明人： Leonid Aizikovitch Sjmaenok ,  Vadim Yevgenyevich Banine ,  Josephus Jacobus Smits ,  Lambertus Adrianus Van Den Wildenberg ,  Alexander Alexandrovitch Schmidt ,  Arnoud Cornelis Wassink ,  Eric Louis Willem Verpalen ,  Antonius Johannes Van De Pas ,  Paul Peter Anna Antonius Brom

IPC分类号： A61N5/06 ,  G01J3/10 ,  H05G2/00

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70908 ,  G03F7/70916

摘要： A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels that are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates can be oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap can be provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.

摘要翻译： 光刻设备包括包括用于产生辐射束的辐射源的辐射系统和布置在辐射束的路径中的污染物阱。 污染物捕集器包括限定通道的多个箔或板，其基本上平行于所述辐射束的传播方向布置。 箔或板可以相对于辐射束的光轴基本上径向定向。 污染物阱可以设置有气体注射器，其被配置为至少在两个不同位置将气体喷射到污染物阱的至少一个通道中。

公开(公告)号：US07397056B2

公开(公告)日：2008-07-08

申请号：US11175036

申请日：2005-07-06

申请人： Leonid Aizikovitch Sjmaenok ,  Vadim Yevgenyevich Banine ,  Josephus Jacobus Smits ,  Lambertus Adrianus Van De Wildenberg ,  Alexander Alexandrovitch Schmidt ,  Arnoud Cornelis Wassink ,  Eric Louis Willem Verpalen ,  Antonius Johannes Van De Pas

发明人： Leonid Aizikovitch Sjmaenok ,  Vadim Yevgenyevich Banine ,  Josephus Jacobus Smits ,  Lambertus Adrianus Van De Wildenberg ,  Alexander Alexandrovitch Schmidt ,  Arnoud Cornelis Wassink ,  Eric Louis Willem Verpalen ,  Antonius Johannes Van De Pas

IPC分类号： H01J65/04

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70908 ,  G03F7/70916

摘要： A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels which are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates are oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap is provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.

摘要翻译： 光刻设备包括包括用于产生辐射束的辐射源的辐射系统和布置在辐射束的路径中的污染物阱。 污染物捕集器包括限定通道的多个箔或板，其基本上平行于所述辐射束的传播方向布置。 箔或板相对于辐射束的光轴基本上径向定向。 污染物陷阱设置有气体注射器，其被配置为至少在两个不同位置将气体喷射到污染物阱的至少一个通道中。