Invention Grant
- Patent Title: Discharge light source with electron beam excitation
- Patent Title (中): 放电光源与电子束激发
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Application No.: US10506273Application Date: 2003-02-26
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Publication No.: US07397193B2Publication Date: 2008-07-08
- Inventor: Albrecht Kraus
- Applicant: Albrecht Kraus
- Applicant Address: NL Eindhoven
- Assignee: Koninklijke Philips Electronics, N.V.
- Current Assignee: Koninklijke Philips Electronics, N.V.
- Current Assignee Address: NL Eindhoven
- Priority: DE10209642 20020305
- International Application: PCT/IB03/00717 WO 20030226
- International Announcement: WO03/075313 WO 20030912
- Main IPC: H01J17/20
- IPC: H01J17/20
Abstract:
A light source has a discharge vessel which is filled with a filling gas, and an electron beam source which is arranged in vacuum or in a region of low pressure. The electron beam source generates electrons which are propelled through an entry foil into the discharge vessel. An electric field may be generated inside the discharge vessel.
Public/Granted literature
- US20050117621A1 Discharge light source with electron beam excitation Public/Granted day:2005-06-02
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