发明授权
- 专利标题: Environmental control in a reticle SMIF pod
- 专利标题(中): 光栅SMIF盒中的环境控制
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申请号: US11396949申请日: 2006-04-03
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公开(公告)号: US07400383B2公开(公告)日: 2008-07-15
- 发明人: David L. Halbmaier , Anthony Simpson , William M. Goodwin , Oleg P. Kishkovich , Thomas B. Kielbaso , Frank Manganiello
- 申请人: David L. Halbmaier , Anthony Simpson , William M. Goodwin , Oleg P. Kishkovich , Thomas B. Kielbaso , Frank Manganiello
- 申请人地址: US MN Chaska
- 专利权人: Entegris, Inc.
- 当前专利权人: Entegris, Inc.
- 当前专利权人地址: US MN Chaska
- 代理机构: Patterson, Theunte, Skaar & Christensen, P.A.
- 主分类号: G03B27/58
- IPC分类号: G03B27/58
摘要:
The present invention provides a standardized mechanical interface (SMIF) reticle pod that is configured to provide a controlled environment for supporting a reticle wherein the controlled environment is maintained substantially free of crystal growth causing contaminants. Accordingly, there is provided a layered filter with filter elements capable of filtering particulates and adsorbing gaseous contaminants. The filter has an inwardly facing face generally planar shaped with a surface area that is substantially half or more of the area of the reticle face. The inwardly facing face is placed in close proximity to the reticle patterned surface and has an area that is a significant fraction of the reticle patterned surface area. The SMIF pod is also provided with a purge system configured to inject a very dry gas within the controlled environment to flush the controlled environment of contaminants as well as to regenerate the filter.
公开/授权文献
- US20060266011A1 Environmental control in a reticle SMIF pod 公开/授权日:2006-11-30
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