发明授权
US07400393B2 Method and apparatus for detecting defects in a specimen utilizing information concerning the specimen
有权
用于利用关于样本的信息来检测样本中的缺陷的方法和装置
- 专利标题: Method and apparatus for detecting defects in a specimen utilizing information concerning the specimen
- 专利标题(中): 用于利用关于样本的信息来检测样本中的缺陷的方法和装置
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申请号: US11478617申请日: 2006-07-03
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公开(公告)号: US07400393B2公开(公告)日: 2008-07-15
- 发明人: Yukihiro Shibata , Shunji Maeda , Hidetoshi Nishiyama
- 申请人: Yukihiro Shibata , Shunji Maeda , Hidetoshi Nishiyama
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP2005-261564 20050909
- 主分类号: G01N21/88
- IPC分类号: G01N21/88
摘要:
This invention provides a defect inspection method and apparatus that can easily and quickly determine, from among a plurality of inspection conditions, a condition that allows for an inspection with high sensitivity. The inspection apparatus has a variety of optical functions to cover a variety of kinds of defects to be inspected (shape, material, nearby pattern, etc.). For each optical function, grayscale depths of defects that the operator wants detected and of pseudo defects that he or she wants undetected are accumulated for future use, so that conditions conducive to a higher sensitivity and a lower pseudo defect detection rate can be selected efficiently. Conditions that can be selected for optical systems include a bright-field illumination, a dark-field illumination and a bright-/dark-field composite illumination, illumination wavelength bands, polarization filters and spatial filters.
公开/授权文献
- US20070058164A1 Method and apparatus for detecting defects 公开/授权日:2007-03-15
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